The update consists of the addition of the following text:
- The principles of atomic layer deposition, a thin film growth method in its part enabling the continuation of semiconductor device scaling according to the Moore's law in the 2000s, were developed by Soviet scientists Valentin Aleskovsky and Stanislav Koltsov in the early 1960s and independently discovered in 1974 by Tuomo Suntola.
The three references mentioned are the three reviews/essays generated in the Virtual Project on the History of ALD:
- Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail (2016-12-16). "Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the "Virtual Project on the History of ALD"". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35 (1): 010801. doi:10.1116/1.4971389. ISSN 0734-2101.
- Puurunen, Riikka L. (2014-12-01). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10-11-12): 332–344. doi:10.1002/cvde.201402012. ISSN 1521-3862.
- Malygin, Anatolii A.; Drozd, Victor E.; Malkov, Anatolii A.; Smirnov, Vladimir M. (2015-12-01). "From V. B. Aleskovskii's "Framework" Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition". Chemical Vapor Deposition. 21 (10-11-12): 216–240.
Virtual Project on the History of ALD (VPHA) - in atmosphere of Openness, Respect, and Trust